EP4是新一代的成像椭偏仪，它有机地结合了传统光谱椭偏仪和光学显微镜技术。这使得我们能够在小至1µm的微结构上以椭偏仪的灵敏度表征薄膜厚度和折射率。显微镜部分能够同时测量光学系统全视场范围内的所有结构。传统的椭偏仪注重于测量整个光斑，而不能实现高精度的横向分辨率，并且需要逐点测量。 EP4的显微镜功能使得我们能够获得微观结构的椭偏增强对比图像。在相机的实时图像中可以看到折射率或厚度的微小变化。允许识别椭偏测量的感兴趣区域（选区测量），以获得厚度（0.1 nm-10µm）和折射率的值。单次测量就可以获取厚度和折射率横向变化的3D图。 各种联用技术，例如原子力显微镜（AFM）、石英晶体微天平（QCM-D）、反射式测量仪、拉曼光谱仪等等，可以对同一区域进行原位分析。 另有在各种受控温度和气氛环境下测量的附件可选。
每个像素的光谱椭偏测量
可以在小至1微米的微结构上确定厚度和折射率
通过在实时椭偏视图中绘制区域直观选择测量区域
从紫外到近红外
The EP4, our latest generation of imaging ellipsometers, combines ellipsometry and microsopy. This enables the characterization of thickness and refractive index with the sensitivity of ellipsometry on micro-structures as small as 1 µm.
The modular EP4 software allows direct control and parallel or offline analysis. The EP4 control operates the instrument. Regions for measurements can be selected in the live view. Multiple samples can be arranged and measured automatically. The DataStudio enables data processing of the recorded data. Histogram analysis and line profiles offer a great insight into the details for your samples. The EP4 Model allows the modeling of the samples. Its intuitive handling concept helps the user to create simple to complex sample structures of thin films. It yields information on thickness and refractive indices of the sample. Further physical parameters, e.g. Bandgap or Volume Fraction of a mixed material layer can be obtained as well.
